SPECTRO ARCOS with UV-PLUS technology
eliminates purge gas

Conventional ICP-OES instruments rely on a constant supply of purge gas, because certain often-analyzed elements (including most or all nonmetals) require measurements below 200 nanometers (nm) in the advanced UV range. Unfortunately, conventional designs are open to the environment, so atmospheric air is present in their optical paths. And lines below 180 nm are strongly absorbed by the molecular oxygen and water in that air. Such instruments must purge air with argon or nitrogen gas at each startup, and this process can take up to 2 hours.

The SPECTRO ARCOS’s innovative UV-PLUS technology eliminates constant purging and purging delays, and allows users to start and stop the instrument at will. The spectrometer achieves highly stable analytical results and excellent low UV performance, right from the start. Saving an estimated 600 cubic meters of purge gas per year means users can save $3800 annually in purge gas costs.

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